Andrew Wayne Ott

  • 2540 Citations
19942018

Research output per year

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Research Output

  • 2540 Citations
  • 18 Article
  • 3 Conference article
  • 2 Conference contribution
  • 1 Comment/debate
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Article
2018

Building a Sustainable Portfolio of Core Facilities: a Case Study

Hockberger, P. E., Weiss, J., Rosen, A. & Ott, A. W., Sep 1 2018, In : Journal of biomolecular techniques : JBT. 29, 3, p. 79-92 14 p.

Research output: Contribution to journalArticle

5 Scopus citations
2009

NHC-Catalyzed Reactions of Aryloxyacetaldehydes: A Domino Elimination/Conjugate Addition/Acylation Process for the Synthesis of Substituted Coumarins

Phillips, E. M., Wadamoto, M., Roth, H. S., Ott, A. W. & Scheidt, K. A., 2009, In : Organic Letters. 11, p. 105-108

Research output: Contribution to journalArticle

75 Scopus citations
2001

Near perfect heteroepitaxy of diamond islands on Si(111)

Liu, X., Babcock, J. R., Lane, M. A., Belot, J. A., Ott, A. W., Metz, M. V., Kannewurf, C. R., Chang, R. P. H. & Marks, T. J., Jan 1 2001, In : Advanced Materials. 13, 2, p. 22-24 3 p.

Research output: Contribution to journalArticle

Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Liu, X., Babcock, J. R., Lane, M. A., Belot, J. A., Ott, A. W., Metz, M. V., Kannewurf, C. R., Chang, R. P. H. & Marks, T. J., Jan 1 2001, In : Chemical Vapor Deposition. 7, 1, p. 25-28 4 p.

Research output: Contribution to journalArticle

15 Scopus citations
1999

Atomic layer-controlled growth of transparent conducting ZnO on plastic substrates

Ott, A. W. & Chang, R. P. H., Mar 25 1999, In : Materials Chemistry and Physics. 58, 2, p. 132-138 7 p.

Research output: Contribution to journalArticle

138 Scopus citations

Atomic layer deposition of SiO 2 using catalyzed and uncatalyzed self-limiting surface reactions

Klaus, J. W., Sneh, O., Ott, A. W. & George, S. M., Jun 1 1999, In : Surface Review and Letters. 6, 3-4, p. 435-448 14 p.

Research output: Contribution to journalArticle

45 Scopus citations
1998

Adsorption and decomposition of 1,4-disilabutane (SiH3CH2CH2SiH3) on Si(100) 2×1 and porous silicon surfaces

Okada, L. A., Dillon, A. C., Ott, A. W. & George, S. M., Dec 5 1998, In : Surface Science. 418, 2, p. 353-366 14 p.

Research output: Contribution to journalArticle

5 Scopus citations

Atomic layer controlled growth of Si3N4 films using sequential surface reactions

Klaus, J. W., Ott, A. W., Dillon, A. C. & George, S. M., Nov 27 1998, In : Surface Science. 418, 1

Research output: Contribution to journalArticle

73 Scopus citations

In Situ Monitoring of Atomic Layer Controlled Pore Reduction in Alumina Tubular Membranes Using Sequential Surface Reactions

Berland, B. S., Gartland, I. P., Ott, A. W. & George, S. M., 1998, In : Chemical Materials. 10, p. 3941-3950

Research output: Contribution to journalArticle

44 Scopus citations
1997

Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

Ott, A. W., Klaus, J. W., Johnson, J. M. & George, S. M., Jan 5 1997, In : Thin Solid Films. 292, 1-2, p. 135-144 10 p.

Research output: Contribution to journalArticle

424 Scopus citations

Atomic layer controlled growth of SiO2 films using binary reaction sequence chemistry

Klaus, J. W., Ott, A. W., Johnson, J. M. & George, S. M., Mar 3 1997, In : Applied Physics Letters. 70, 9, p. 1092-1094 3 p.

Research output: Contribution to journalArticle

91 Scopus citations

Modification of Porous Alumina Membranes Using Al2O3 Atomic Layer Controlled Deposition

Ott, A. W., Klaus, J. W., Johnson, J. M., George, S. M., McCarley, K. C. & Way, J. D., Mar 1 1997, In : Chemistry of Materials. 9, 3, p. 707-714 8 p.

Research output: Contribution to journalArticle

71 Scopus citations

Surface chemistry of In 2 O 3 deposition using In(CH 3 ) 3 and H 2 O in a binary reaction sequence

Ott, A. W., Johnson, J. M., Klaus, J. W. & George, S. M., Jan 1 1997, In : Applied Surface Science. 112, p. 205-215 11 p.

Research output: Contribution to journalArticle

32 Scopus citations
1996

Atomic layer controlled deposition of Al 2 O 3 films using binary reaction sequence chemistry

Ott, A. W., McCarley, K. C., Klaus, J. W., Way, J. D. & George, S. M., Jan 1 1996, In : Applied Surface Science. 107, p. 128-136 9 p.

Research output: Contribution to journalArticle

118 Scopus citations

Surface chemistry for atomic layer growth

George, S. M., Ott, A. W. & Klaus, J. W., Aug 1 1996, In : Journal of physical chemistry. 100, 31, p. 13121-13131 11 p.

Research output: Contribution to journalArticle

620 Scopus citations
1995

Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence

Sneh, O., Wise, M. L., Ott, A. W., Okada, L. A. & George, S. M., Jul 10 1995, In : Surface Science. 334, 1-3, p. 135-152 18 p.

Research output: Contribution to journalArticle

117 Scopus citations

Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

Dillon, A. C., Ott, A. W., Way, J. D. & George, S. M., Jan 1 1995, In : Surface Science. 322, 1-3, p. 230-242 13 p.

Research output: Contribution to journalArticle

383 Scopus citations
1994

Atomic layer controlled deposition of SiO2 and Al2O3 using ABAB... binary reaction sequence chemistry

George, S. M., Sneh, O., Dillon, A. C., Wise, M. L., Ott, A. W., Okada, L. A. & Way, J. D., Dec 2 1994, In : Applied Surface Science. 82-83, C, p. 460-467 8 p.

Research output: Contribution to journalArticle

79 Scopus citations