GWU/NRL will provide no fewer than four multi-layered epitaxial samples which NW will fabricate into mesa structures suitable for selective etching studies. Different etch chemistries will be applied to the different combinations of materials in order to study highly selective etches (selectivity ≥ 2000) suitable for InP-based materials. NW will demonstrate the release of microscale chiplets from their native substrate using the most effective selective etch.
|Effective start/end date||12/15/17 → 12/14/19|
- George Washington University (17-S32 // DE-AR0000882)
- Advanced Research Projects Agency - Energy (17-S32 // DE-AR0000882)
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