Keyphrases
Type-II Superlattice
100%
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Focal Plane Array
100%
InAsSb
100%
Chemical Vapor Deposition Growth
100%
Molecular Beam Epitaxy
50%
InSb
50%
Decomposition Efficiency
33%
Growth Temperature
33%
Material System
33%
Low Melting Temperature
16%
Manufacturable
16%
Microarray Technology
16%
Evolutionary
16%
Processing Techniques
16%
High Performance
16%
Material Quality
16%
Persistent Surveillance
16%
Mass Production
16%
Quality Techniques
16%
Large Format
16%
Surveillance Applications
16%
Low Melting Point
16%
Device Architecture
16%
Imaging Sensor
16%
Growth Method
16%
Tensile Strain
16%
Equilibrium Vapor Pressure
16%
High Cost
16%
Stable Hydrides
16%
GaSb
16%
Production Application
16%
Infrared Imaging
16%
Materials Processing
16%
Rapid Development
16%
Efficiency Increase
16%
Precursor Decomposition
16%
Large Focal Plane Array
16%
Interfacial Layer
16%
Engineering
Focal Plane
100%
Superlattice
100%
Metal Organic Chemical Vapor Deposition
100%
Melting Point
50%
Material System
33%
Growth Temperature
33%
Interfacial Layer
16%
Material Quality
16%
Melting Temperature
16%
Processing Technique
16%
Tensile Strain
16%
Growth Method
16%
Mass Production
16%
Equilibrium Vapor Pressure
16%