The ability to position structures down to the nano-/molecular-scale with exquisite and precise control over size, site, shape and overall architecture is the hallmark of modern science and engineering. In this context, electron-beam lithography (eBL) has become the workhorse for positioning or etching down to sub-nm scale precision across large spatial area. We propose to acquire an electron-beam lithography (eBL) system with necessary accessories for interdisciplinary research, integrated hands-on education and inspiring societal outreach.
|Effective start/end date||10/1/18 → 9/30/21|
- National Science Foundation (DMR-1828676)