MRI: Acquisition of a Dedicated Electron Beam Lithography (eBL) System for Interdisciplinary Research, Hands-on Education and Inspiring Outreach

Project: Research project

Project Details


The ability to position structures down to the nano-/molecular-scale with exquisite and precise control over size, site, shape and overall architecture is the hallmark of modern science and engineering. In this context, electron-beam lithography (eBL) has become the workhorse for positioning or etching down to sub-nm scale precision across large spatial area. We propose to acquire an electron-beam lithography (eBL) system with necessary accessories for interdisciplinary research, integrated hands-on education and inspiring societal outreach.
Effective start/end date10/1/189/30/21


  • National Science Foundation (DMR-1828676)


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