This proposal describes scalable fabrication approaches to create photonic moiré nanostructures. In this work, researchers aim to realize moiré patterns of nanoparticle (NP) lattices with tunable symmetries and NP dimensions by modeling and by optimizing three processing steps: (1) forming moiré patterns in photoresist by carrying out multiple exposures of light through transparent, soft photomasks at controlled angles; (2) tuning the geometry of individual photoresist features by development time; and (3) establishing pattern-transfer processes based on photolithography, etching, electron beam deposition, and lift-off (PEEL) to fabricate moiré NP lattices of desired photonic materials.
|Effective start/end date||9/1/20 → 8/31/23|
- National Science Foundation (CMMI-2028773)
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