Abstract
The dewetting resistance of Au 50 nm films fabricated atop Ti/Ta/W/Cr/Al adhesion layers (0.5-5 nm) was investigated. Results show sub-nanometer Ta has superior stability under thermal stress, while W & Ti show best plasmonic response.
Original language | English (US) |
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Title of host publication | CLEO |
Subtitle of host publication | Applications and Technology, CLEO_AT 2019 |
Publisher | Optica Publishing Group (formerly OSA) |
ISBN (Print) | 9781943580576 |
DOIs | |
State | Published - 2019 |
Event | CLEO: Applications and Technology, CLEO_AT 2019 - San Jose, United States Duration: May 5 2019 → May 10 2019 |
Publication series
Name | Optics InfoBase Conference Papers |
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Volume | Part F127-CLEO_AT 2019 |
ISSN (Electronic) | 2162-2701 |
Conference
Conference | CLEO: Applications and Technology, CLEO_AT 2019 |
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Country/Territory | United States |
City | San Jose |
Period | 5/5/19 → 5/10/19 |
Funding
This work was funded by SFI grant no. SFI/12/RC/2278, and ASRC. AKPL acknowledges support from the U.S. DOE Office of Science, Office of Basic Energy Sciences, Materials Science and Engineering Division.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Mechanics of Materials