Abstract
The results of a comparison study of continuous diamond coatings deposited on tungsten carbide-6% cobalt tool inserts using CF4 and CH4 gas sources are presented. The CH4 grown diamond film utilizes a thin (1200 Å) amorphous silicon interlayer for adhesion while the CF4 diamond film is deposited directly onto the tool insert. The films are characterized by scanning and transmission electron microscopy, and Raman spectroscopy and are diamond. Diamond films produced with CF4 gas have much higher (nearly a factor of 4) growth rates and better adhesion (about a factor of 3) than diamond films grown with CH4 gas. An aluminum-17% Si alloy is machined with the diamond-coated tool inserts to determine their performance in a machining environment. Using CF4, diamond is believed to grow by first removing the tungsten from the tungsten carbide to expose the underlying carbon atoms. Subsequent carbon containing gaseous species can then bond to the exposed carbon and initiate and propagate diamond growth.
Original language | English (US) |
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Pages (from-to) | 155-162 |
Number of pages | 8 |
Journal | Surface and Coatings Technology |
Volume | 57 |
Issue number | 2-3 |
DOIs | |
State | Published - May 28 1993 |
Funding
The authors would like to thank Dean Edwards and his staff at Ingersoll Cutting Tools for providing and machining the tool insert samples. This work is supported by the Department of Energy under contract number DE-FG02-87ER45314 and the Office of Naval Research.
ASJC Scopus subject areas
- General Chemistry
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry