A concept for a deployable normal incidence EUV mirror based on shape memory alloy sheets

Melville P. Ulmer*, Jeffrey H. Dugard, Daniel Quispe, Donald B. Buchholz, Steven P. Stagon, Yip Wah Chung, Jian Cao, Konstantina Kritikos, Nicolas Guerra, Mark T. Stahl, Ron Shiri, Raj Vaidyanathan

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations


Based on the science case for the SMEX ESCAPE mission, a normal incidence EUV mirror mission would be an interesting follow on. Our provisional SmallSat/CubeSat design has a 1 m diameter primary deployable mirror. The mirror would be coated with multilayers for normal incidence EUV reflectivity. The deployable mirror substrate is a shape memory alloy (SMA). The SMA needs to be over coated with a material that can be polished and then smoothed further. The combination that worked well on an aluminum cylinder is a high phosphorous content electroless nickel (eNiP) super-polished and then coated with carbon nitride (CNx). The multilayers were deposited on the eNiP+CNx stack. We report here our progress toward putting in place the pieces for a proof of concept. We discuss a scale up of previous return to shape on sheets of NiTi and the ray tracing results that demonstrate a sufficient return to shape of 1 micron. Furthermore, corrections post deployment are possible if desired.

Original languageEnglish (US)
Title of host publicationSpace Telescopes and Instrumentation 2022
Subtitle of host publicationUltraviolet to Gamma Ray
EditorsJan-Willem A. den Herder, Shouleh Nikzad, Kazuhiro Nakazawa
ISBN (Electronic)9781510653436
StatePublished - 2022
EventSpace Telescopes and Instrumentation 2022: Ultraviolet to Gamma Ray - Montreal, United States
Duration: Jul 17 2022Jul 22 2022

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


ConferenceSpace Telescopes and Instrumentation 2022: Ultraviolet to Gamma Ray
Country/TerritoryUnited States


  • EUV Astronomy
  • NiTi
  • multilayers

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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