A miniature electron-beam evaporator for an ultrahigh-vacuum atom-probe field-ion microscope

X. W. Lin, J. G. Hu, David N Seidman*, H. Morikawa

*Corresponding author for this work

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A miniature electron-beam evaporator (MEBE) has been fabricated and adapted to our ultrahigh-vacuum atom-probe field-ion microscope (APFIM). The MEBE allows for in situ vapor deposition-under ultrahigh-vacuum conditions (< 4 × 10-10 Torr)-of a wide range of elements, on the surface of an atomically clean FIM specimen; the surface is prepared via the field-evaporation process. The deposition rate of an evaporant from the MEBE is calibrated to give an accurate value of this quantity. Examples of the deposition-at ≊0.3 nm min-1- of silicon or titanium on tungsten FIM specimens are presented. And in the case of a Ti/W couple it is demonstrated that an interface between a tungsten substrate and a titanium overlayer is chemically sharp on an atomic scale; the titanium was vapor deposited at a substrate temperature of 77 K. Also a 20-kV electron-beam gun was adapted to our APFIM. This gun is useful for in situ electron-beam heating of bilayer couples, or the introduction of point defects in metal oxide or semiconductor overlayers via electronic mechanisms.

Original languageEnglish (US)
Pages (from-to)3745-3749
Number of pages5
JournalReview of Scientific Instruments
Volume61
Issue number12
DOIs
StatePublished - Dec 1 1990

Fingerprint

Ion microscopes
ion microscopes
evaporators
Ultrahigh vacuum
Evaporators
ultrahigh vacuum
Electron beams
electron beams
Atoms
probes
titanium
Titanium
atoms
Tungsten
tungsten
Vapor deposition
Substrates
Point defects
Deposition rates
point defects

ASJC Scopus subject areas

  • Instrumentation

Cite this

@article{2754e3305ee8422bb187967d085d92a4,
title = "A miniature electron-beam evaporator for an ultrahigh-vacuum atom-probe field-ion microscope",
abstract = "A miniature electron-beam evaporator (MEBE) has been fabricated and adapted to our ultrahigh-vacuum atom-probe field-ion microscope (APFIM). The MEBE allows for in situ vapor deposition-under ultrahigh-vacuum conditions (< 4 × 10-10 Torr)-of a wide range of elements, on the surface of an atomically clean FIM specimen; the surface is prepared via the field-evaporation process. The deposition rate of an evaporant from the MEBE is calibrated to give an accurate value of this quantity. Examples of the deposition-at ≊0.3 nm min-1- of silicon or titanium on tungsten FIM specimens are presented. And in the case of a Ti/W couple it is demonstrated that an interface between a tungsten substrate and a titanium overlayer is chemically sharp on an atomic scale; the titanium was vapor deposited at a substrate temperature of 77 K. Also a 20-kV electron-beam gun was adapted to our APFIM. This gun is useful for in situ electron-beam heating of bilayer couples, or the introduction of point defects in metal oxide or semiconductor overlayers via electronic mechanisms.",
author = "Lin, {X. W.} and Hu, {J. G.} and Seidman, {David N} and H. Morikawa",
year = "1990",
month = "12",
day = "1",
doi = "10.1063/1.1141547",
language = "English (US)",
volume = "61",
pages = "3745--3749",
journal = "Review of Scientific Instruments",
issn = "0034-6748",
publisher = "American Institute of Physics Publising LLC",
number = "12",

}

A miniature electron-beam evaporator for an ultrahigh-vacuum atom-probe field-ion microscope. / Lin, X. W.; Hu, J. G.; Seidman, David N; Morikawa, H.

In: Review of Scientific Instruments, Vol. 61, No. 12, 01.12.1990, p. 3745-3749.

Research output: Contribution to journalArticle

TY - JOUR

T1 - A miniature electron-beam evaporator for an ultrahigh-vacuum atom-probe field-ion microscope

AU - Lin, X. W.

AU - Hu, J. G.

AU - Seidman, David N

AU - Morikawa, H.

PY - 1990/12/1

Y1 - 1990/12/1

N2 - A miniature electron-beam evaporator (MEBE) has been fabricated and adapted to our ultrahigh-vacuum atom-probe field-ion microscope (APFIM). The MEBE allows for in situ vapor deposition-under ultrahigh-vacuum conditions (< 4 × 10-10 Torr)-of a wide range of elements, on the surface of an atomically clean FIM specimen; the surface is prepared via the field-evaporation process. The deposition rate of an evaporant from the MEBE is calibrated to give an accurate value of this quantity. Examples of the deposition-at ≊0.3 nm min-1- of silicon or titanium on tungsten FIM specimens are presented. And in the case of a Ti/W couple it is demonstrated that an interface between a tungsten substrate and a titanium overlayer is chemically sharp on an atomic scale; the titanium was vapor deposited at a substrate temperature of 77 K. Also a 20-kV electron-beam gun was adapted to our APFIM. This gun is useful for in situ electron-beam heating of bilayer couples, or the introduction of point defects in metal oxide or semiconductor overlayers via electronic mechanisms.

AB - A miniature electron-beam evaporator (MEBE) has been fabricated and adapted to our ultrahigh-vacuum atom-probe field-ion microscope (APFIM). The MEBE allows for in situ vapor deposition-under ultrahigh-vacuum conditions (< 4 × 10-10 Torr)-of a wide range of elements, on the surface of an atomically clean FIM specimen; the surface is prepared via the field-evaporation process. The deposition rate of an evaporant from the MEBE is calibrated to give an accurate value of this quantity. Examples of the deposition-at ≊0.3 nm min-1- of silicon or titanium on tungsten FIM specimens are presented. And in the case of a Ti/W couple it is demonstrated that an interface between a tungsten substrate and a titanium overlayer is chemically sharp on an atomic scale; the titanium was vapor deposited at a substrate temperature of 77 K. Also a 20-kV electron-beam gun was adapted to our APFIM. This gun is useful for in situ electron-beam heating of bilayer couples, or the introduction of point defects in metal oxide or semiconductor overlayers via electronic mechanisms.

UR - http://www.scopus.com/inward/record.url?scp=0039650443&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0039650443&partnerID=8YFLogxK

U2 - 10.1063/1.1141547

DO - 10.1063/1.1141547

M3 - Article

VL - 61

SP - 3745

EP - 3749

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

SN - 0034-6748

IS - 12

ER -