A miniature x-ray compatible sputtering system for studying in situ high Tcthin film growth

J. Q. Zheng, M. C. Shih, X. K. Wang, S. Williams, Pulak Dutta, John B Ketterson

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high Tc oxide films. The geometry is compatible with the in-plane and conventional θ–2θ diffraction geometries and a chamber with two appropriate sector x-ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.

Original languageEnglish (US)
Pages (from-to)128-132
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume9
Issue number1
DOIs
StatePublished - Jan 1 1991

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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