A miniature x-ray compatible sputtering system for studying in situ high Tcthin film growth

J. Q. Zheng; M. C. Shih; X. K. Wang; S. Williams; P. Dutta; J. B. Ketterson

doi:10.1116/1.577112

A miniature x-ray compatible sputtering system for studying in situ high T_cthin film growth

J. Q. Zheng, M. C. Shih, X. K. Wang, S. Williams, P. Dutta, J. B. Ketterson

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Abstract

We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high T_c oxide films. The geometry is compatible with the in-plane and conventional θ–2θ diffraction geometries and a chamber with two appropriate sector x-ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.

Original language	English (US)
Pages (from-to)	128-132
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	9
Issue number	1
DOIs	https://doi.org/10.1116/1.577112
State	Published - Jan 1991

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.577112

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@article{c8e450b8208f4f639e348a00ae7ca1c5,

title = "A miniature x-ray compatible sputtering system for studying in situ high Tcthin film growth",

abstract = "We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high Tc oxide films. The geometry is compatible with the in-plane and conventional θ–2θ diffraction geometries and a chamber with two appropriate sector x-ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.",

author = "Zheng, {J. Q.} and Shih, {M. C.} and Wang, {X. K.} and S. Williams and P. Dutta and Ketterson, {J. B.}",

year = "1991",

month = jan,

doi = "10.1116/1.577112",

language = "English (US)",

volume = "9",

pages = "128--132",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "1",

}

TY - JOUR

T1 - A miniature x-ray compatible sputtering system for studying in situ high Tcthin film growth

AU - Zheng, J. Q.

AU - Shih, M. C.

AU - Wang, X. K.

AU - Williams, S.

AU - Dutta, P.

AU - Ketterson, J. B.

PY - 1991/1

Y1 - 1991/1

N2 - We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high Tc oxide films. The geometry is compatible with the in-plane and conventional θ–2θ diffraction geometries and a chamber with two appropriate sector x-ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.

AB - We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high Tc oxide films. The geometry is compatible with the in-plane and conventional θ–2θ diffraction geometries and a chamber with two appropriate sector x-ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.

UR - http://www.scopus.com/inward/record.url?scp=0012747874&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0012747874&partnerID=8YFLogxK

U2 - 10.1116/1.577112

DO - 10.1116/1.577112

M3 - Article

AN - SCOPUS:0012747874

SN - 0734-2101

VL - 9

SP - 128

EP - 132

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 1

ER -

A miniature x-ray compatible sputtering system for studying in situ high T_cthin film growth

Abstract

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