A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes

Jeffrey A. Klug, Matthew S. Weimer, Jonathan Daniel Emery, Angel Yanguas-Gil, Sönke Seifert, Christian M. Schlepütz, Alex B.F. Martinson, Jeffrey W. Elam, Adam S. Hock, Thomas Proslier

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

Synchrotron characterization techniques provide some of the most powerful tools for the study of film structure and chemistry. The brilliance and tunability of the Advanced Photon Source allow access to scattering and spectroscopic techniques unavailable with in-house laboratory setups and provide the opportunity to probe various atomic layer deposition (ALD) processes in situ starting at the very first deposition cycle. Here, we present the design and implementation of a portable ALD instrument which possesses a modular reactor scheme that enables simple experimental switchover between various beamlines and characterization techniques. As first examples, we present in situ results for (1) X-ray surface scattering and reflectivity measurements of epitaxial ZnO ALD on sapphire, (2) grazing-incidence small angle scattering of MnO nucleation on silicon, and (3) grazing-incidence X-ray absorption spectroscopy of nucleation-regime Er2O3 ALD on amorphous ALD alumina and single crystalline sapphire.

Original languageEnglish (US)
Article number113901
JournalReview of Scientific Instruments
Volume86
Issue number11
DOIs
StatePublished - Nov 1 2015

ASJC Scopus subject areas

  • Instrumentation

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