A "molecular eraser" for dip-pen nanolithography

Jae Won Jang*, Daniel Maspoch, Tsuyohiko Fujigaya, Chad A. Mirkin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

28 Scopus citations


An erasing method for repairing defective nanostructures generated in a dip-pen nanolithography (DPN) using conductive tip and conductive atomic force microscope (c-AFM) to electrochemically induce desorption is described. c-AFM would be used to selectively desorb portions of a monolayer-based structure made by DPN with alkanethiol inks on gold. c-AFM is used to selectively control the elimination of 16-mercaptohexadecanoic acid (MHA) nanostructures. This erasing technique can be coupled with DPN, and the eliminated MHA features can be backfilled with a new ink by simply coating the cantilever with the desired molecule. This procedure results in the elimination of the MHA-based triangle and replacement with a 11-ferrocenyl-1-undecanethiol (FUT) based compound without a damage to the 1-octadecanethiol (ODT)-coated regions of the substrate.

Original languageEnglish (US)
Pages (from-to)600-605
Number of pages6
Issue number4
StatePublished - Apr 2007


  • Alkanethiols
  • Atomic force microscopy
  • Dip-pen nanolithography
  • Self-assembled monolayers

ASJC Scopus subject areas

  • Biotechnology
  • Biomaterials
  • Chemistry(all)
  • Materials Science(all)

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