A novel self-assembled and maskless technique for highly uniform arrays of nano-holes and nano-pillars

W. Wu; D. Dey; O. Memis; A. Katsnelson; Hooman Mohseni

A novel self-assembled and maskless technique for highly uniform arrays of nano-holes and nano-pillars

W. Wu^*, D. Dey, O. Memis, A. Katsnelson, Hooman Mohseni

^*Corresponding author for this work

Electrical and Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We present a low-cost and high-throughput process for realization of two-dimensional arrays of deep sub-wavelength features using a self-assembled monolayer of HCP silica and polystyrene microspheres and well-developed photoresist lithography. This method utilizes the microspheres as super-lenses to fabricate highly uniform nano-holes and nano-pillars arrays over large areas on conventional positive and negative photoresists, and with a high aspect ratio. The period and diameter of the holes and pillars formed with this technique can be controlled precisely and independently. We also present our 3-D FDTD modeling, which shows a good agreement with the experimental results. The technique is simple, fast, economical, and is a convergence of bottom-up and top-down lithography.

Original language	English (US)
Title of host publication	Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008
Pages	574-577
Number of pages	4
Volume	1
State	Published - Oct 13 2008
Event	2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008 - Quebec City, QC, United States Duration: Jun 1 2008 → Jun 5 2008

Other

Other	2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008
Country/Territory	United States
City	Quebec City, QC
Period	6/1/08 → 6/5/08

Keywords

Lithography
Microspheres
Nanoholes and nanopillars

ASJC Scopus subject areas

Mechanical Engineering

Cite this

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title = "A novel self-assembled and maskless technique for highly uniform arrays of nano-holes and nano-pillars",

abstract = "We present a low-cost and high-throughput process for realization of two-dimensional arrays of deep sub-wavelength features using a self-assembled monolayer of HCP silica and polystyrene microspheres and well-developed photoresist lithography. This method utilizes the microspheres as super-lenses to fabricate highly uniform nano-holes and nano-pillars arrays over large areas on conventional positive and negative photoresists, and with a high aspect ratio. The period and diameter of the holes and pillars formed with this technique can be controlled precisely and independently. We also present our 3-D FDTD modeling, which shows a good agreement with the experimental results. The technique is simple, fast, economical, and is a convergence of bottom-up and top-down lithography.",

keywords = "Lithography, Microspheres, Nanoholes and nanopillars",

author = "W. Wu and D. Dey and O. Memis and A. Katsnelson and Hooman Mohseni",

year = "2008",

month = oct,

day = "13",

language = "English (US)",

isbn = "9781420085075",

volume = "1",

pages = "574--577",

booktitle = "Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008",

note = "2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008 ; Conference date: 01-06-2008 Through 05-06-2008",

}

Wu, W, Dey, D, Memis, O, Katsnelson, A & Mohseni, H 2008, A novel self-assembled and maskless technique for highly uniform arrays of nano-holes and nano-pillars. in Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008. vol. 1, pp. 574-577, 2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008, Quebec City, QC, United States, 6/1/08.

A novel self-assembled and maskless technique for highly uniform arrays of nano-holes and nano-pillars. / Wu, W.; Dey, D.; Memis, O. et al.
Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008. Vol. 1 2008. p. 574-577.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - A novel self-assembled and maskless technique for highly uniform arrays of nano-holes and nano-pillars

AU - Wu, W.

AU - Dey, D.

AU - Memis, O.

AU - Katsnelson, A.

AU - Mohseni, Hooman

PY - 2008/10/13

Y1 - 2008/10/13

N2 - We present a low-cost and high-throughput process for realization of two-dimensional arrays of deep sub-wavelength features using a self-assembled monolayer of HCP silica and polystyrene microspheres and well-developed photoresist lithography. This method utilizes the microspheres as super-lenses to fabricate highly uniform nano-holes and nano-pillars arrays over large areas on conventional positive and negative photoresists, and with a high aspect ratio. The period and diameter of the holes and pillars formed with this technique can be controlled precisely and independently. We also present our 3-D FDTD modeling, which shows a good agreement with the experimental results. The technique is simple, fast, economical, and is a convergence of bottom-up and top-down lithography.

AB - We present a low-cost and high-throughput process for realization of two-dimensional arrays of deep sub-wavelength features using a self-assembled monolayer of HCP silica and polystyrene microspheres and well-developed photoresist lithography. This method utilizes the microspheres as super-lenses to fabricate highly uniform nano-holes and nano-pillars arrays over large areas on conventional positive and negative photoresists, and with a high aspect ratio. The period and diameter of the holes and pillars formed with this technique can be controlled precisely and independently. We also present our 3-D FDTD modeling, which shows a good agreement with the experimental results. The technique is simple, fast, economical, and is a convergence of bottom-up and top-down lithography.

KW - Lithography

KW - Microspheres

KW - Nanoholes and nanopillars

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M3 - Conference contribution

AN - SCOPUS:53349127167

SN - 9781420085075

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VL - 1

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BT - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008

T2 - 2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008

Y2 - 1 June 2008 through 5 June 2008

ER -

A novel self-assembled and maskless technique for highly uniform arrays of nano-holes and nano-pillars

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Keywords

ASJC Scopus subject areas

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