A novel self-assembled and maskless technique for highly uniform arrays of nano-holes and nano-pillars

W. Wu*, D. Dey, O. Memis, A. Katsnelson, Hooman Mohseni

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present a low-cost and high-throughput process for realization of two-dimensional arrays of deep sub-wavelength features using a self-assembled monolayer of HCP silica and polystyrene microspheres and well-developed photoresist lithography. This method utilizes the microspheres as super-lenses to fabricate highly uniform nano-holes and nano-pillars arrays over large areas on conventional positive and negative photoresists, and with a high aspect ratio. The period and diameter of the holes and pillars formed with this technique can be controlled precisely and independently. We also present our 3-D FDTD modeling, which shows a good agreement with the experimental results. The technique is simple, fast, economical, and is a convergence of bottom-up and top-down lithography.

Original languageEnglish (US)
Title of host publicationTechnical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008
Pages574-577
Number of pages4
Volume1
StatePublished - Oct 13 2008
Event2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008 - Quebec City, QC, United States
Duration: Jun 1 2008Jun 5 2008

Other

Other2008 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2008 Joint Meeting, Nanotechnology 2008
CountryUnited States
CityQuebec City, QC
Period6/1/086/5/08

Keywords

  • Lithography
  • Microspheres
  • Nanoholes and nanopillars

ASJC Scopus subject areas

  • Mechanical Engineering

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