A numerical study of resolution and contrast in soft X-ray contact microscopy

Y. Wang*, C. Jacobsen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

We consider the case of soft X-ray contact microscopy using a laser- produced plasma. We model the effects of sample and resist absorption and diffraction as well as the process of isotropic development of the photoresist. Our results indicate that the micrograph resolution depends heavily on the exposure and the sample-to-resist distance. In addition, the contrast of small features depends crucially on the development procedure to the point where information on such features may be destroyed by excessive development. These issues must be kept in mind when interpreting contact microradiographs of high resolution, low contrast objects such as biological structures.

Original languageEnglish (US)
Pages (from-to)159-169
Number of pages11
JournalJournal of Microscopy
Volume191
Issue number2
DOIs
StatePublished - 1998

Keywords

  • Contrast
  • Photoresists
  • Resolution
  • Soft X-ray microscopy

ASJC Scopus subject areas

  • Pathology and Forensic Medicine
  • Histology

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