A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition

I. S. Kim; O. K. Farha; J. T. Hupp; L. Gagliardi; K. W. Chapman; C. J. Cramer; A. B.F. Martinson

doi:10.1149/07506.0093ecst

A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition

I. S. Kim, O. K. Farha, J. T. Hupp, L. Gagliardi, K. W. Chapman, C. J. Cramer, A. B.F. Martinson

Chemistry

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Scopus citations

Abstract

The connectivity of NU-1000, a metal-organic framework, gives rise to Zr₆ nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m²/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.

Original language	English (US)
Title of host publication	Atomic Layer Deposition Applications 12
Editors	F. Roozeboom, S. De Gendt, J. W. Elam, O. van der Straten, J. Dendooven, C. Liu, C. Huffman
Publisher	Electrochemical Society Inc.
Pages	93-99
Number of pages	7
Edition	6
ISBN (Electronic)	9781607687238, 9781607687672, 9781607687689, 9781607687696, 9781607687702, 9781607687719, 9781607687726, 9781607687733, 9781607687740, 9781607687757, 9781607687771, 9781607687788, 9781607687795, 9781607687801, 9781607687818, 9781607687825, 9781607687832, 9781607687849, 9781607687856, 9781607687863, 9781607687887, 9781607687894, 9781607687900, 9781607687917, 9781607687924, 9781607687931, 9781607687948, 9781607687955, 9781607687962, 9781607687979, 9781607687986, 9781607687993, 9781607688006, 9781607688013, 9781607688020, 9781607688037
DOIs	https://doi.org/10.1149/07506.0093ecst
State	Published - 2016
Event	Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting - Honolulu, United States Duration: Oct 2 2016 → Oct 7 2016

Publication series

Name	ECS Transactions
Number	6
Volume	75
ISSN (Print)	1938-6737
ISSN (Electronic)	1938-5862

Other

Other	Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting
Country/Territory	United States
City	Honolulu
Period	10/2/16 → 10/7/16

ASJC Scopus subject areas

Engineering(all)

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10.1149/07506.0093ecst

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Kim, I. S., Farha, O. K., Hupp, J. T., Gagliardi, L., Chapman, K. W., Cramer, C. J., & Martinson, A. B. F. (2016). A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. In F. Roozeboom, S. De Gendt, J. W. Elam, O. van der Straten, J. Dendooven, C. Liu, & C. Huffman (Eds.), Atomic Layer Deposition Applications 12 (6 ed., pp. 93-99). (ECS Transactions; Vol. 75, No. 6). Electrochemical Society Inc.. https://doi.org/10.1149/07506.0093ecst

Kim, I. S. ; Farha, O. K. ; Hupp, J. T. ; Gagliardi, L. ; Chapman, K. W. ; Cramer, C. J. ; Martinson, A. B.F. / A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. Atomic Layer Deposition Applications 12. editor / F. Roozeboom ; S. De Gendt ; J. W. Elam ; O. van der Straten ; J. Dendooven ; C. Liu ; C. Huffman. 6. ed. Electrochemical Society Inc., 2016. pp. 93-99 (ECS Transactions; 6).

@inproceedings{d805bf5d804d4ae0b29f56bdd53100f8,

title = "A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition",

abstract = "The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.",

author = "Kim, {I. S.} and Farha, {O. K.} and Hupp, {J. T.} and L. Gagliardi and Chapman, {K. W.} and Cramer, {C. J.} and Martinson, {A. B.F.}",

note = "Funding Information: This work was supported as part of the Inorganometallic Catalysis Design Center, an Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Basic Energy Sciences under Award #DE-SC0012702. Work done at Argonne made use of the Advanced Photon Source, an Office of Science User Facility operated for the U.S. DOE/Office of Science by Argonne National Laboratory, was supported by the US DOE, Contract No. DE-AC02-06CH11357. Publisher Copyright: {\textcopyright} 2016 The Electrochemical Society.; Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting ; Conference date: 02-10-2016 Through 07-10-2016",

year = "2016",

doi = "10.1149/07506.0093ecst",

language = "English (US)",

series = "ECS Transactions",

publisher = "Electrochemical Society Inc.",

number = "6",

pages = "93--99",

editor = "F. Roozeboom and {De Gendt}, S. and Elam, {J. W.} and {van der Straten}, O. and J. Dendooven and C. Liu and C. Huffman",

booktitle = "Atomic Layer Deposition Applications 12",

edition = "6",

}

Kim, IS, Farha, OK , Hupp, JT, Gagliardi, L, Chapman, KW, Cramer, CJ & Martinson, ABF 2016, A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. in F Roozeboom, S De Gendt, JW Elam, O van der Straten, J Dendooven, C Liu & C Huffman (eds), Atomic Layer Deposition Applications 12. 6 edn, ECS Transactions, no. 6, vol. 75, Electrochemical Society Inc., pp. 93-99, Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting, Honolulu, United States, 10/2/16. https://doi.org/10.1149/07506.0093ecst

A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. / Kim, I. S.; Farha, O. K.; Hupp, J. T.; Gagliardi, L.; Chapman, K. W.; Cramer, C. J.; Martinson, A. B.F.

Atomic Layer Deposition Applications 12. ed. / F. Roozeboom; S. De Gendt; J. W. Elam; O. van der Straten; J. Dendooven; C. Liu; C. Huffman. 6. ed. Electrochemical Society Inc., 2016. p. 93-99 (ECS Transactions; Vol. 75, No. 6).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition

AU - Kim, I. S.

AU - Farha, O. K.

AU - Hupp, J. T.

AU - Gagliardi, L.

AU - Chapman, K. W.

AU - Cramer, C. J.

AU - Martinson, A. B.F.

N1 - Funding Information: This work was supported as part of the Inorganometallic Catalysis Design Center, an Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Basic Energy Sciences under Award #DE-SC0012702. Work done at Argonne made use of the Advanced Photon Source, an Office of Science User Facility operated for the U.S. DOE/Office of Science by Argonne National Laboratory, was supported by the US DOE, Contract No. DE-AC02-06CH11357. Publisher Copyright: © 2016 The Electrochemical Society.

PY - 2016

Y1 - 2016

N2 - The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.

AB - The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.

UR - http://www.scopus.com/inward/record.url?scp=84991728488&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84991728488&partnerID=8YFLogxK

U2 - 10.1149/07506.0093ecst

DO - 10.1149/07506.0093ecst

M3 - Conference contribution

AN - SCOPUS:84991728488

T3 - ECS Transactions

SP - 93

EP - 99

BT - Atomic Layer Deposition Applications 12

A2 - Roozeboom, F.

A2 - De Gendt, S.

A2 - Elam, J. W.

A2 - van der Straten, O.

A2 - Dendooven, J.

A2 - Liu, C.

A2 - Huffman, C.

PB - Electrochemical Society Inc.

T2 - Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting

Y2 - 2 October 2016 through 7 October 2016

ER -

Kim IS, Farha OK , Hupp JT, Gagliardi L, Chapman KW, Cramer CJ et al. A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. In Roozeboom F, De Gendt S, Elam JW, van der Straten O, Dendooven J, Liu C, Huffman C, editors, Atomic Layer Deposition Applications 12. 6 ed. Electrochemical Society Inc. 2016. p. 93-99. (ECS Transactions; 6). https://doi.org/10.1149/07506.0093ecst

A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition

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