A pulser for medium-frequency modulated direct-current reactive sputter deposition of insulators

G. T. Kiehne*, M. Z. Lin, G. Wang, W. H. Xiang, H. Cao, J. B. Ketterson

*Corresponding author for this work

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

We present the circuit design of a unit for medium-frequency modulated direct-current (dc) reactive sputter deposition of electrical insulators. The unit is connected in series between a commercial dc sputtering power supply and a sputtering cathode (target). It modulates the voltage applied to the sputtering cathode in a pulsed, asymmetric bipolar fashion. The pulsing effectively eliminates the problem of arcing at the target surface. The simple circuit is a low-cost, flexible alternative to commercially available units. To demonstrate its utility, we deposited a film of 5 SiO2/TiO2 bilayers, forming a highly reflective dielectric optical mirror with a stop band centered near a wavelength in air of 600 nm.

Original languageEnglish (US)
Pages (from-to)2560-2562
Number of pages3
JournalReview of Scientific Instruments
Volume71
Issue number6
DOIs
StatePublished - Jun 2000

ASJC Scopus subject areas

  • Instrumentation

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