A structure study of the electroless deposition of Au on Si(1 1 1):H

S. Warren, A. Reitzle, A. Kazimirov, J. C. Ziegler, O. Bunk, L. X. Cao, F. U. Renner, D. M. Kolb, M. J. Bedzyk, J. Zegenhagen*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

39 Scopus citations

Abstract

Electroless deposition of gold in monolayer amounts on hydrogen terminated Si(1 1 1) was studied by a variety of structure sensitive techniques. Rutherford back scattering data revealed a linear relationship between the Au coverage and the concentration of the Au solution used for deposition. Atomic force microscopy and surface X-ray diffraction studies indicated cluster formation, with the Au(1 1 1) face epitaxially aligned to the Si(1 1 1):H substrate. However, X-ray standing wave experiments at coverage below one monolayer suggested the formation of a gold layer. Both clusters and isolated Au atoms appear to be present at all coverages, which is explained by the formation of type of Au 'wetting layer', in addition to cluster formation which increases as the coverage increases.

Original languageEnglish (US)
Pages (from-to)287-298
Number of pages12
JournalSurface Science
Volume496
Issue number3
DOIs
StatePublished - Jan 10 2002

Keywords

  • Electrochemical methods
  • Epitaxy
  • Gold
  • Silicon
  • Single crystal surfaces
  • Solid-liquid interfaces
  • X-ray scattering, diffraction, and reflection
  • X-ray standing waves

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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