A torsional strain mechanism to tune pitch in supramolecular helices

Liang Shi Li; Hongzhou Jiang; Benjamin W. Messmore; Steve R. Bull; Samuel I. Stupp

doi:10.1002/anie.200701328

A torsional strain mechanism to tune pitch in supramolecular helices

Liang Shi Li^*, Hongzhou Jiang, Benjamin W. Messmore, Steve R. Bull, Samuel I. Stupp

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

124 Scopus citations

Abstract

(Figure Presented) On the turn: Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).

Original language	English (US)
Pages (from-to)	5873-5876
Number of pages	4
Journal	Angewandte Chemie - International Edition
Volume	46
Issue number	31
DOIs	https://doi.org/10.1002/anie.200701328
State	Published - 2007

Keywords

Helical structures
Nanostructures
Self-assembly
Superhelices
Torsional strain

ASJC Scopus subject areas

General Chemistry
Catalysis

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10.1002/anie.200701328

Cite this

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title = "A torsional strain mechanism to tune pitch in supramolecular helices",

abstract = "(Figure Presented) On the turn: Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).",

keywords = "Helical structures, Nanostructures, Self-assembly, Superhelices, Torsional strain",

author = "Li, {Liang Shi} and Hongzhou Jiang and Messmore, {Benjamin W.} and Bull, {Steve R.} and Stupp, {Samuel I.}",

year = "2007",

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volume = "46",

pages = "5873--5876",

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T1 - A torsional strain mechanism to tune pitch in supramolecular helices

AU - Li, Liang Shi

AU - Jiang, Hongzhou

AU - Messmore, Benjamin W.

AU - Bull, Steve R.

AU - Stupp, Samuel I.

PY - 2007

Y1 - 2007

N2 - (Figure Presented) On the turn: Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).

AB - (Figure Presented) On the turn: Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).

KW - Helical structures

KW - Nanostructures

KW - Self-assembly

KW - Superhelices

KW - Torsional strain

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JF - Angewandte Chemie - International Edition

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A torsional strain mechanism to tune pitch in supramolecular helices

Abstract

Keywords

ASJC Scopus subject areas

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