A torsional strain mechanism to tune pitch in supramolecular helices

Liang Shi Li*, Hongzhou Jiang, Benjamin W. Messmore, Steve R. Bull, Samuel Stupp

*Corresponding author for this work

Research output: Contribution to journalArticle

103 Scopus citations

Abstract

(Figure Presented) On the turn: Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).

Original languageEnglish (US)
Pages (from-to)5873-5876
Number of pages4
JournalAngewandte Chemie - International Edition
Volume46
Issue number31
DOIs
StatePublished - Aug 15 2007

Keywords

  • Helical structures
  • Nanostructures
  • Self-assembly
  • Superhelices
  • Torsional strain

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)

Fingerprint Dive into the research topics of 'A torsional strain mechanism to tune pitch in supramolecular helices'. Together they form a unique fingerprint.

  • Cite this