Additive soft-lithographic patterning of submicrometer- and nanometer-scale large-area resists on electronic materials

Heejoon Ahn, Keon Jae Lee, Anne Shim, John A. Rogers, Ralph G. Nuzzo*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

22 Scopus citations

Abstract

We describe a novel soft-lithographic technique possessing broad utility for the fabrication of large area, nanoscale (∼100 nm) multilayer resist structures on electronic material substrates. This additive patterning method transfers ultrathin poly(dimethylsiloxane) (PDMS) decals to an underlying SiO 2-capped organic planarazation layer. The PDMS patterns serve as a latent image through which high-quality multilayer resist structures can be developed using reactive ion-beam etching.

Original languageEnglish (US)
Pages (from-to)2533-2537
Number of pages5
JournalNano letters
Volume5
Issue number12
DOIs
StatePublished - Dec 1 2005

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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