The Nanoscale Organic Light Emitting Diode (OLED) arrays are fabricated over large areas with higher pixel densities using soft nanolithography parallel patterning methods. The composite polydimethyl siloxane (PDMS) stamps are used to generate arrays of 250-nm-diameter holes in negative photoresists supported on conducting substrates. The pixel densities of 105 pixels per mm2 are achieved with defect densities depending on imperfections in the PDMS masks. Addressable 1D arrays of Ruthenium bipyridyl complex based nano-OLEDs SU-8 are fabricated on glass substrates patterned with five 0.9-μm lines on a 1.1-μm pitch. The use of precise mechanical alignment techniques or fabrication of SU8 OLED hole arrays with large spacing achieves a perfect registration between the patterned Indium Tin Oxide (ITO) and the SU-8 nanoholes.
|Original language||English (US)|
|Number of pages||3|
|State||Published - Mar 1 2007|
- Light-emitting diodes
ASJC Scopus subject areas
- Materials Science(all)