Advances in contemporary nanosphere lithographic techniques

Xiaoyu Zhang, Alyson V. Whitney, Jing Zhao, Erin M. Hicks, Richard P. Van Duyne*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

98 Scopus citations

Abstract

Nanosphere lithography (NSL) is an inexpensive, high throughput, materials general nanofabrication technique capable of producing a large variety of nanoscale structures including well-ordered 2 dimensional nanoparticle arrays. In this review, we will summarize the most recent advances in the fabrication of size-tunable nanoparticles using NSL Four examples of new NSL-derived materials will be described: (1) The development of a method to release NSL nanoparticles from the substrate for applications in solution environments, (2) the fabrication of triangular nanoholes with reactive ion etching, (3) the electrochemical fine tuning of the structure of a silver nanoparticle and the wavelength of its localized surface plasmon resonance (LSPR), and (4) the growth of ultra thin protective dielectric layers on NSL-fabricated Ag nanotriangles using atomic layer deposition (ALD).

Original languageEnglish (US)
Pages (from-to)1920-1934
Number of pages15
JournalJournal of Nanoscience and Nanotechnology
Volume6
Issue number7
DOIs
StatePublished - Jul 2006

Keywords

  • Atomic Layer Deposition
  • Indium Tin Oxide
  • Localized Surface Plasmon Resonance
  • Nanosphere Lithography
  • Nanowell
  • Reactive Ion Etching
  • Silver

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

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