Advances in plasma-driven solution electrochemistry

Peter J. Bruggeman*, Renee R. Frontiera, Uwe Kortshagen, Mark J. Kushner, Suljo Linic, George C. Schatz, Himashi Andaraarachchi, Subhajyoti Chaudhuri, Han Ting Chen, Collin D. Clay, Tiago C. Dias, Scott Doyle, Leighton O. Jones, Mackenzie Meyer, Chelsea M. Mueller, Jae Hyun Nam, Astrid Raisanen, Christopher C. Rich, Tanubhav Srivastava, Chi XuDongxuan Xu, Yi Zhang

*Corresponding author for this work

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Chemical Engineering