ALD synthesis of platinum nanoparticles on single-crystal SrTiO 3 pretreated with wet chemical etching

Chuandao Wang*, Pratik Koirala, Peter Stair, Laurence Marks

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations


Formic acid-hydrogen peroxide and buffered hydrogen fluoride-hydrogen peroxide solutions were used to etch single-crystal strontium titanate to remove carbon contamination and increase hydroxyl group density to improve atomic layer deposition onto these materials. X-ray photoelectron spectroscopy indicated that both are effective for carbon contamination removal. However, for increasing hydroxyl group density on the strontium titanate surface, the buffered hydrogen fluoride-hydrogen peroxide is more effective. Transmission electron microscopy and x-ray photoemission show enhanced platinum deposition on the etched strontium titanate surface. These results provide the basis for optimizing atomic layer deposition for other technologically relevant materials.

Original languageEnglish (US)
Pages (from-to)661-665
Number of pages5
JournalApplied Surface Science
StatePublished - Nov 15 2017


  • Atomic layer deposition
  • Etch
  • Platinum
  • Surface condition

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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