Abstract
Metal impurities have been used to mediate the growth of anisotropic crystalline semiconductor nanowires for a variety of applications. A majority of efforts have employed the vapor-liquid-solid approach at growth temperatures above the metal-semiconductor eutectic. Sub-eutectic vapor-solid-solid (VSS) growth has received less attention but may provide advantages including reduced processing temperatures and more abrupt heterojunctions. We present a review of the VSS growth of Si and Ge nanowires together with new studies of Mn-mediated Ge and Si nanowires to assess the generality of sub-eutectic nanowire growth and highlight key requirements.
Original language | English (US) |
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Pages (from-to) | 849-857 |
Number of pages | 9 |
Journal | Journal of Materials Chemistry |
Volume | 19 |
Issue number | 7 |
DOIs | |
State | Published - Feb 9 2009 |
ASJC Scopus subject areas
- Chemistry(all)
- Materials Chemistry