An effective layout decomposition method for dsa with multiple patterning in contact-hole generation

Yunfeng Yang, Wai Shing Luk, Hai Zhou, David Z. Pan, Dian Zhou, Changhao Yan*, Xuan Zeng

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


Directed self-assembly (DSA) complemented with multiple patterning (MP) is an attractive next generation lithography (NGL) technique for contact-hole generation. Nevertheless, a high-quality DSA-aware layout decomposer is required to enable the technology. In this article, we introduce an efficient method which incorporates a set packing for generating DSA template candidates and a local search method. Besides, a multi-start strategy is integrated into the framework to prevent the local minima. Our framework encourages the reuse of existing coloring solvers. Hence, the development cost can significantly be reduced. In addition, for DSA multiple patterning where the number of masks is larger than two, we present an efficient iterative partition based method. Experimental results showthat comparedwith the state-of-the-artwork, our methods can achieve roughly 100× speedup for double patterning, and 78.8% conflict reduction with 5× speedup for triple patterning on the dense graphs.

Original languageEnglish (US)
Article number11
JournalACM Transactions on Design Automation of Electronic Systems
Issue number1
StatePublished - Sep 2017


  • Design for manufacturability
  • Directed self-assembly
  • Iterative partition
  • Multiple patterning
  • Multiple start points
  • Set packing

ASJC Scopus subject areas

  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design
  • Electrical and Electronic Engineering


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