An efficient algorithm for stencil planning and optimization in E-Beam lithography

Jiabei Ge, Changhao Yan*, Hai Zhou, Dian Zhou, Xuan Zeng

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Character projection is a promising technique to dramatically improve throughput of E-beam lithography. However, its effectiveness depends on how good the stencils are planned and optimized. Recently Kuang and Young proposed an efficient heuristic based on 2-D bin-packing for the stencil optimization. In this paper, we identified drawbacks in their approaches, and developed a better algorithm that reduces the shot numbers to less than half of theirs in average. The key point is introducing the merit frequency/area (f/A) to select candidate characters and proposing an accurate and efficient algorithm to estimate the occupied area of characters before placement. Experimental results verify the effectiveness of the proposed method.

Original languageEnglish (US)
Title of host publication2017 22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages366-371
Number of pages6
ISBN (Electronic)9781509015580
DOIs
StatePublished - Feb 16 2017
Event22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017 - Chiba, Japan
Duration: Jan 16 2017Jan 19 2017

Publication series

NameProceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC

Other

Other22nd Asia and South Pacific Design Automation Conference, ASP-DAC 2017
CountryJapan
CityChiba
Period1/16/171/19/17

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design

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