An efficient method for gradient-aware dummy fill synthesis

Peng Wu, Hai Zhou, Changhao Yan*, Jun Tao, Xuan Zeng

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


In advanced VLSI fabrication, dummy fill is widely employed to solve the pattern dependent manufacturability issues. In this paper, a new linear programming formulation for dummy fill synthesis is proposed, which takes more consideration to the density gradient besides the pattern density. Based on the covering linear programming (CLP), a fast iterative approximation scheme is designed to solve this newly formulated problem. The complexity of the new method is proved to be O(n2log(n)). Experimental results demonstrate the effectiveness of the new formulation, and show good accuracy and time efficiency of the proposed method. Compared with the ordinary LP method, speedup over magnitude is achieved with the acceptable overfill amount.

Original languageEnglish (US)
Pages (from-to)301-309
Number of pages9
JournalIntegration, the VLSI Journal
Issue number3
StatePublished - Jun 2013


  • Design for manufacturability
  • Dummy fill
  • Pattern density gradient

ASJC Scopus subject areas

  • Software
  • Hardware and Architecture
  • Electrical and Electronic Engineering


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