An Electrochemical Etching Procedure for Fabricating Scanning Tunneling Microscopy and Atom-Probe Field-Ion Microscopy Tips

Yeong Cheol Kim; David N. Seidman

doi:10.1007/BF03027195

An Electrochemical Etching Procedure for Fabricating Scanning Tunneling Microscopy and Atom-Probe Field-Ion Microscopy Tips

Yeong Cheol Kim^*, David N. Seidman

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

A two-step electrochemical etching procedure is developed to control the sharpness and shape of tips used for either scanning tunneling microscopy (STM) or atom-probe field-ion microscopy (APFIM). The formation of a neck near a tip's apex is controlled by carefully limiting the amount of chemical solution in contact with the area of the neck. Reproducible, atomically sharp, and appropriately tapered tips can be manually produced with this procedure.

Original language	English (US)
Pages (from-to)	399-404
Number of pages	6
Journal	Metals and Materials International
Volume	9
Issue number	4
DOIs	https://doi.org/10.1007/BF03027195
State	Published - Aug 2003

Keywords

Electrochemical etching
FIM
STM
Tips

ASJC Scopus subject areas

Condensed Matter Physics
Mechanics of Materials
Metals and Alloys
Materials Chemistry

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10.1007/BF03027195

Cite this

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title = "An Electrochemical Etching Procedure for Fabricating Scanning Tunneling Microscopy and Atom-Probe Field-Ion Microscopy Tips",

abstract = "A two-step electrochemical etching procedure is developed to control the sharpness and shape of tips used for either scanning tunneling microscopy (STM) or atom-probe field-ion microscopy (APFIM). The formation of a neck near a tip's apex is controlled by carefully limiting the amount of chemical solution in contact with the area of the neck. Reproducible, atomically sharp, and appropriately tapered tips can be manually produced with this procedure.",

keywords = "Electrochemical etching, FIM, STM, Tips",

author = "Kim, {Yeong Cheol} and Seidman, {David N.}",

note = "Funding Information: This research was funded by the National Science Foundation through a grant to the Materials Research Center at Northwestern University.",

year = "2003",

month = aug,

doi = "10.1007/BF03027195",

language = "English (US)",

volume = "9",

pages = "399--404",

journal = "Metals and Materials International",

issn = "1598-9623",

publisher = "Korean Institute of Metals and Materials",

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T1 - An Electrochemical Etching Procedure for Fabricating Scanning Tunneling Microscopy and Atom-Probe Field-Ion Microscopy Tips

AU - Kim, Yeong Cheol

AU - Seidman, David N.

N1 - Funding Information: This research was funded by the National Science Foundation through a grant to the Materials Research Center at Northwestern University.

PY - 2003/8

Y1 - 2003/8

N2 - A two-step electrochemical etching procedure is developed to control the sharpness and shape of tips used for either scanning tunneling microscopy (STM) or atom-probe field-ion microscopy (APFIM). The formation of a neck near a tip's apex is controlled by carefully limiting the amount of chemical solution in contact with the area of the neck. Reproducible, atomically sharp, and appropriately tapered tips can be manually produced with this procedure.

AB - A two-step electrochemical etching procedure is developed to control the sharpness and shape of tips used for either scanning tunneling microscopy (STM) or atom-probe field-ion microscopy (APFIM). The formation of a neck near a tip's apex is controlled by carefully limiting the amount of chemical solution in contact with the area of the neck. Reproducible, atomically sharp, and appropriately tapered tips can be manually produced with this procedure.

KW - Electrochemical etching

KW - FIM

KW - STM

KW - Tips

UR - http://www.scopus.com/inward/record.url?scp=1842419659&partnerID=8YFLogxK

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U2 - 10.1007/BF03027195

DO - 10.1007/BF03027195

M3 - Article

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SN - 1598-9623

VL - 9

SP - 399

EP - 404

JO - Metals and Materials International

JF - Metals and Materials International

IS - 4

ER -

An Electrochemical Etching Procedure for Fabricating Scanning Tunneling Microscopy and Atom-Probe Field-Ion Microscopy Tips

Abstract

Keywords

ASJC Scopus subject areas

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