An Electrochemical Etching Procedure for Fabricating Scanning Tunneling Microscopy and Atom-Probe Field-Ion Microscopy Tips

Yeong Cheol Kim*, David N. Seidman

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

17 Scopus citations

Abstract

A two-step electrochemical etching procedure is developed to control the sharpness and shape of tips used for either scanning tunneling microscopy (STM) or atom-probe field-ion microscopy (APFIM). The formation of a neck near a tip's apex is controlled by carefully limiting the amount of chemical solution in contact with the area of the neck. Reproducible, atomically sharp, and appropriately tapered tips can be manually produced with this procedure.

Original languageEnglish (US)
Pages (from-to)399-404
Number of pages6
JournalMetals and Materials International
Volume9
Issue number4
DOIs
StatePublished - Aug 2003

Keywords

  • Electrochemical etching
  • FIM
  • STM
  • Tips

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys
  • Materials Chemistry

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