Anisotropic crystalline etching simulation using a continuous cellular automata algorithm

Zhenjun Zhu*, Chang Liu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model. The program provides accurate modeling of etching process with high spatial resolution. Implementation of a dynamic CA technique has resulted in increased simulation speed and reduced memory requirements. A first ACES software based on PC platforms has been realized.

Original languageEnglish (US)
Title of host publicationMicro-Electro-Mechanical Systems (MEMS)
EditorsR.J. Furness
PublisherASME
Pages577-582
Number of pages6
Volume66
StatePublished - Dec 1 1998
EventProceedings of the 1998 ASME International Mechanical Engineering Congress and Exposition - Anaheim, CA, USA
Duration: Nov 15 1998Nov 20 1998

Other

OtherProceedings of the 1998 ASME International Mechanical Engineering Congress and Exposition
CityAnaheim, CA, USA
Period11/15/9811/20/98

ASJC Scopus subject areas

  • Software
  • Mechanical Engineering

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