Abstract
We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model. The program provides accurate modeling of etching process with high spatial resolution. Implementation of a dynamic CA technique has resulted in increased simulation speed and reduced memory requirements. A first ACES software based on PC platforms has been realized.
| Original language | English (US) |
|---|---|
| Title of host publication | Micro-Electro-Mechanical Systems (MEMS) |
| Editors | R.J. Furness |
| Publisher | ASME |
| Pages | 577-582 |
| Number of pages | 6 |
| Volume | 66 |
| State | Published - Dec 1 1998 |
| Event | Proceedings of the 1998 ASME International Mechanical Engineering Congress and Exposition - Anaheim, CA, USA Duration: Nov 15 1998 → Nov 20 1998 |
Other
| Other | Proceedings of the 1998 ASME International Mechanical Engineering Congress and Exposition |
|---|---|
| City | Anaheim, CA, USA |
| Period | 11/15/98 → 11/20/98 |
ASJC Scopus subject areas
- Software
- Mechanical Engineering