Anomalous surface diffusion in nanoscale direct deposition processes

P. Manandhar; J. Jang; G. C. Schatz; M. A. Ratner; S. Hong

doi:10.1103/PhysRevLett.90.115505

Anomalous surface diffusion in nanoscale direct deposition processes

P. Manandhar, J. Jang, G. C. Schatz, M. A. Ratner, S. Hong^*

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Article › peer-review

107 Scopus citations

Abstract

The first systematic study of anomalous diffusion in nanoscale deposition processes is presented. Thus, the experimental and analysis tools in the manuscript can be utilized to study general diffusion processes for organic molecules on solid surfaces. From a practical point of view, this result demonstrates that after proper considerations, nanoscale direct deposition methods can be utilized to generate organic molecular patterns for very weak-binding cases.

Original language	English (US)
Article number	115505
Pages (from-to)	115505/1-115505/4
Number of pages	1
Journal	Physical review letters
Volume	90
Issue number	11
DOIs	https://doi.org/10.1103/PhysRevLett.90.115505
State	Published - Mar 21 2003

Funding

This project is supported by the AFOSR and NASA. Support for P. M. has been provided by the MARTECH at Florida State University. Support at Northwestern comes from the NSF Nanoscale Science and Engineering Center.

ASJC Scopus subject areas

General Physics and Astronomy

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10.1103/PhysRevLett.90.115505

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abstract = "The first systematic study of anomalous diffusion in nanoscale deposition processes is presented. Thus, the experimental and analysis tools in the manuscript can be utilized to study general diffusion processes for organic molecules on solid surfaces. From a practical point of view, this result demonstrates that after proper considerations, nanoscale direct deposition methods can be utilized to generate organic molecular patterns for very weak-binding cases.",

author = "P. Manandhar and J. Jang and Schatz, {G. C.} and Ratner, {M. A.} and S. Hong",

note = "Funding Information: This project is supported by the AFOSR and NASA. Support for P. M. has been provided by the MARTECH at Florida State University. Support at Northwestern comes from the NSF Nanoscale Science and Engineering Center.",

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AU - Schatz, G. C.

AU - Ratner, M. A.

AU - Hong, S.

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N2 - The first systematic study of anomalous diffusion in nanoscale deposition processes is presented. Thus, the experimental and analysis tools in the manuscript can be utilized to study general diffusion processes for organic molecules on solid surfaces. From a practical point of view, this result demonstrates that after proper considerations, nanoscale direct deposition methods can be utilized to generate organic molecular patterns for very weak-binding cases.

AB - The first systematic study of anomalous diffusion in nanoscale deposition processes is presented. Thus, the experimental and analysis tools in the manuscript can be utilized to study general diffusion processes for organic molecules on solid surfaces. From a practical point of view, this result demonstrates that after proper considerations, nanoscale direct deposition methods can be utilized to generate organic molecular patterns for very weak-binding cases.

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Anomalous surface diffusion in nanoscale direct deposition processes

Abstract

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ASJC Scopus subject areas

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