Anomalous surface diffusion in nanoscale direct deposition processes

P. Manandhar, J. Jang, G. C. Schatz, M. A. Ratner, S. Hong*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

93 Scopus citations

Abstract

The first systematic study of anomalous diffusion in nanoscale deposition processes is presented. Thus, the experimental and analysis tools in the manuscript can be utilized to study general diffusion processes for organic molecules on solid surfaces. From a practical point of view, this result demonstrates that after proper considerations, nanoscale direct deposition methods can be utilized to generate organic molecular patterns for very weak-binding cases.

Original languageEnglish (US)
Article number115505
Pages (from-to)115505/1-115505/4
JournalPhysical review letters
Volume90
Issue number11
StatePublished - Mar 21 2003

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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