Application of holographic technique to the photonic crystal quantum cascade lasers

Quan Yong Lu, Feng Qi Liu*, Li Jun Wang, Jun Qi Liu, Lu Li, Zhan Guo Wang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present the fabrication and characterization of mid-infrared photonic-crystal quantum cascade lasers (PC QCLs). Holographic lithography (HL) instead of electron beam lithography (EBL) has been used in the preparation of PC lattices to simplify the fabrication procedures. Compared with the EBL, the HL technique provides a rapid and large area processing capability with high efficiency and low cost. Two PC lattice structures, namely a first-order square lattice and a tilted rectangular lattice were defined using a multi-exposure two-beam holographic technique, respectively. The devices with square PC lattice exhibit single longitudinal mode emission with a side mode suppression ratio (SMSR) about 20 dB. While, no sign of improvement in the far field distribution for the device was observed, which was attributed to the lack of two-dimensional coupling mechanism in this lattice structure. Whereas devices with tilted rectangular lattice PC lattices exhibit the near-diffraction-limited beam emission with the full width at half maximum of the far field divergence angles about 4.5° for devices with stripe widths of 55 μm. Single longitudinal mode emission with SMSR≈20 dB was achieved in the temperature range of 80-210 K. The single-facet output power was above 510 mW for a 55 μm × 2.5 mm laser bar at 85 K in pulsed operation. This economical and efficient holographic fabrication process of photonic crystal quantum cascade lasers with high power, single-mode operation and near-diffraction-limited beam quality would pave the way for the wide commercial application of the devices.

Original languageEnglish (US)
Title of host publication5th International Symposium on Advanced Optical Manufacturing and Testing Technologies
Subtitle of host publicationDesign, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
DOIs
StatePublished - Dec 27 2010
Event5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems - Dalian, China
Duration: Apr 26 2010Apr 29 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7657
ISSN (Print)0277-786X

Other

Other5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
CountryChina
CityDalian
Period4/26/104/29/10

Keywords

  • Distributed feedback
  • Holographic lithography
  • Photonic crystal
  • Quantum cascade laser

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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