Application of selective chemical reaction concept for controlling the properties of oxides on GaAs

R. P H Chang*, J. J. Coleman, A. J. Polak, L. C. Feldman, C. C. Chang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

We demonstrate how GaAs can be selectively oxidized in a plasma to control the physical and chemical properties of the oxides. Electrical measurements indicate that charged traps can be removed.

Original languageEnglish (US)
Pages (from-to)237-238
Number of pages2
JournalApplied Physics Letters
Volume34
Issue number3
DOIs
StatePublished - 1979

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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