Applications of photocurable PMMS thiol-ene stamps in soft lithography

Luis M. Campos, Tu T. Truong, Dong Eun Shim, Michael D. Dimitriou, Daniel Shir, Ines Meinel, Jeffrey A. Gerbec, H. Thomas Hahn, John A. Rogers, Craig J. Hawker

Research output: Contribution to journalArticlepeer-review

74 Scopus citations


We report the performance and characterization of a material based on poly[(3-mercaptopropyl)-methylsiloxane] (PMMS) in various soft lithography applications. PMMS stamps were made by cross-linking with triallyl cyanurate and ethoxylated (4) bisphenol A dimethacrylate via thiol-ene mixed-mode chemistry. The surface chemistry of the materials was characterized by XPS when varied from hydrophilic through oxygen plasma treatment, to hydrophobic by exposure to a fluorinated trichlorosilane agent. The materials are transparent above 300 nm and thermally stable up to 225 °C, thus rendering them capable to be employed in step-and-flash imprint lithography, nanoimprint lithography, nanotransfer printing, and proximity-field nanopatterning. The successful pattern replication from the micrometer to sub-100 nm scale was demonstrated.

Original languageEnglish (US)
Pages (from-to)5319-5326
Number of pages8
JournalChemistry of Materials
Issue number21
StatePublished - Nov 10 2009

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry


Dive into the research topics of 'Applications of photocurable PMMS thiol-ene stamps in soft lithography'. Together they form a unique fingerprint.

Cite this