Applications of photocurable PMMS thiol-ene stamps in soft lithography

Luis M. Campos; Tu T. Truong; Dong Eun Shim; Michael D. Dimitriou; Daniel Shir; Ines Meinel; Jeffrey A. Gerbec; H. Thomas Hahn; John A. Rogers; Craig J. Hawker

doi:10.1021/cm902506a

Applications of photocurable PMMS thiol-ene stamps in soft lithography

Luis M. Campos, Tu T. Truong, Dong Eun Shim, Michael D. Dimitriou, Daniel Shir, Ines Meinel, Jeffrey A. Gerbec, H. Thomas Hahn, John A. Rogers, Craig J. Hawker

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

74 Scopus citations

Abstract

We report the performance and characterization of a material based on poly[(3-mercaptopropyl)-methylsiloxane] (PMMS) in various soft lithography applications. PMMS stamps were made by cross-linking with triallyl cyanurate and ethoxylated (4) bisphenol A dimethacrylate via thiol-ene mixed-mode chemistry. The surface chemistry of the materials was characterized by XPS when varied from hydrophilic through oxygen plasma treatment, to hydrophobic by exposure to a fluorinated trichlorosilane agent. The materials are transparent above 300 nm and thermally stable up to 225 °C, thus rendering them capable to be employed in step-and-flash imprint lithography, nanoimprint lithography, nanotransfer printing, and proximity-field nanopatterning. The successful pattern replication from the micrometer to sub-100 nm scale was demonstrated.

Original language	English (US)
Pages (from-to)	5319-5326
Number of pages	8
Journal	Chemistry of Materials
Volume	21
Issue number	21
DOIs	https://doi.org/10.1021/cm902506a
State	Published - Nov 10 2009

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)
Materials Chemistry

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10.1021/cm902506a

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title = "Applications of photocurable PMMS thiol-ene stamps in soft lithography",

abstract = "We report the performance and characterization of a material based on poly[(3-mercaptopropyl)-methylsiloxane] (PMMS) in various soft lithography applications. PMMS stamps were made by cross-linking with triallyl cyanurate and ethoxylated (4) bisphenol A dimethacrylate via thiol-ene mixed-mode chemistry. The surface chemistry of the materials was characterized by XPS when varied from hydrophilic through oxygen plasma treatment, to hydrophobic by exposure to a fluorinated trichlorosilane agent. The materials are transparent above 300 nm and thermally stable up to 225 °C, thus rendering them capable to be employed in step-and-flash imprint lithography, nanoimprint lithography, nanotransfer printing, and proximity-field nanopatterning. The successful pattern replication from the micrometer to sub-100 nm scale was demonstrated.",

author = "Campos, {Luis M.} and Truong, {Tu T.} and Shim, {Dong Eun} and Dimitriou, {Michael D.} and Daniel Shir and Ines Meinel and Gerbec, {Jeffrey A.} and Hahn, {H. Thomas} and Rogers, {John A.} and Hawker, {Craig J.}",

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AU - Campos, Luis M.

AU - Truong, Tu T.

AU - Shim, Dong Eun

AU - Dimitriou, Michael D.

AU - Shir, Daniel

AU - Meinel, Ines

AU - Gerbec, Jeffrey A.

AU - Hahn, H. Thomas

AU - Rogers, John A.

AU - Hawker, Craig J.

PY - 2009/11/10

Y1 - 2009/11/10

N2 - We report the performance and characterization of a material based on poly[(3-mercaptopropyl)-methylsiloxane] (PMMS) in various soft lithography applications. PMMS stamps were made by cross-linking with triallyl cyanurate and ethoxylated (4) bisphenol A dimethacrylate via thiol-ene mixed-mode chemistry. The surface chemistry of the materials was characterized by XPS when varied from hydrophilic through oxygen plasma treatment, to hydrophobic by exposure to a fluorinated trichlorosilane agent. The materials are transparent above 300 nm and thermally stable up to 225 °C, thus rendering them capable to be employed in step-and-flash imprint lithography, nanoimprint lithography, nanotransfer printing, and proximity-field nanopatterning. The successful pattern replication from the micrometer to sub-100 nm scale was demonstrated.

AB - We report the performance and characterization of a material based on poly[(3-mercaptopropyl)-methylsiloxane] (PMMS) in various soft lithography applications. PMMS stamps were made by cross-linking with triallyl cyanurate and ethoxylated (4) bisphenol A dimethacrylate via thiol-ene mixed-mode chemistry. The surface chemistry of the materials was characterized by XPS when varied from hydrophilic through oxygen plasma treatment, to hydrophobic by exposure to a fluorinated trichlorosilane agent. The materials are transparent above 300 nm and thermally stable up to 225 °C, thus rendering them capable to be employed in step-and-flash imprint lithography, nanoimprint lithography, nanotransfer printing, and proximity-field nanopatterning. The successful pattern replication from the micrometer to sub-100 nm scale was demonstrated.

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Applications of photocurable PMMS thiol-ene stamps in soft lithography

Abstract

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