Atomic force microscope base nanolithography for reproducible micro and nanofabrication

Arash Dehzangi*, Farhad Larki, Burhanuddin Y. Majlis, Zainab Kazemi, Mohammad Mahdi Ariannejad, A. Makarimi Abdullah, Mahmood Goodarz Nasery, Manizheh Navasery, Sabar D. Hutagalung

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication.

Original languageEnglish (US)
Title of host publicationIEEE International Conference on Semiconductor Electronics, Proceedings, ICSE
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages408-411
Number of pages4
ISBN (Electronic)9781479957606
DOIs
StatePublished - Oct 10 2014
Event11th IEEE International Conference on Semiconductor Electronics, ICSE 2014 - Kuala Lumpur, Malaysia
Duration: Aug 27 2014Aug 29 2014

Publication series

NameIEEE International Conference on Semiconductor Electronics, Proceedings, ICSE

Other

Other11th IEEE International Conference on Semiconductor Electronics, ICSE 2014
CountryMalaysia
CityKuala Lumpur
Period8/27/148/29/14

Keywords

  • Atomic force microscope
  • Local anodic oxidation
  • Nanolithography
  • Silicon-on-insulator

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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    Dehzangi, A., Larki, F., Majlis, B. Y., Kazemi, Z., Ariannejad, M. M., Abdullah, A. M., Nasery, M. G., Navasery, M., & Hutagalung, S. D. (2014). Atomic force microscope base nanolithography for reproducible micro and nanofabrication. In IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE (pp. 408-411). [6920884] (IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/SMELEC.2014.6920884