Abstract
Surface structure studies of GaAs(100) with and without chemical passivation have been made using atomic force microscopy (AFM). Passivation was carried out using a solution of SeS2 which has proved to be a successful passivating agent as seen from the increase in the photoluminescence (PL) intensity. Atomic force microscopy results indicate that it is possible to obtain ordered surface layers on GaAs using SeS2.
Original language | English (US) |
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Number of pages | 1 |
Journal | Applied Physics Letters |
State | Published - Dec 1 1995 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)