Atomic layer controlled deposition of SiO2 and Al2O3 using ABAB... binary reaction sequence chemistry

S. M. George*, O. Sneh, A. C. Dillon, M. L. Wise, A. W. Ott, L. A. Okada, J. D. Way

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

82 Scopus citations


Sequential ABAB... surface chemical reactions can be employed for atomic layer controlled deposition. We have examined the binary reactions SiCl4+2H2O{right semidirect product}SiO2+4HCl for SiO2 deposition and 2Al(CH3)3+3H2O {right semidirect product} Al2O3+ 6CH4 for Al2O3 deposition. Each binary reaction (A + B {right semidirect product} products) was performed sequentially by individual exposures to the A reactant and then the B reactant. If each surface reaction is self-limiting, repetitive ABAB... cycling may produce layer-by-layer controlled growth. For example, the individual "A" and "B" surface reactions for SiO2 deposition can be described by (A) Si-OH + SiCl4 {right semidirect product} Si-O-SiCl3 + HCl, (B) Si-Cl + H2O {right semidirect product} Si-OH + HCl. We have studied ABAB... binary reaction sequences for SiO2 and Al2O3 deposition using laser-induced thermal desorption, temperature-programmed desorption and Auger electron spectroscopy techniques on single-crystal Si(100) surfaces. Fourier transform infrared spectroscopy techniques were also employed to examine these binary reaction schemes on high surface area SiO2 and Al2O3 samples. Controlled deposition of SiO2 and Al2O3 was demonstrated and optimized utilizing the above techniques. Under the appropriate conditions, each surface reaction was self-terminating and atomic layer controlled growth was a direct consequence of the binary reaction sequence chemistry.

Original languageEnglish (US)
Pages (from-to)460-467
Number of pages8
JournalApplied Surface Science
Issue numberC
StatePublished - Dec 2 1994

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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