Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence

O. Sneh, M. L. Wise, A. W. Ott, L. A. Okada, S. M. George*

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

136 Scopus citations

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Material Science

Engineering

Chemical Engineering