Atomic-level robustness of the Si(100)-2×1: H surface following liquid phase chemical treatments in atmospheric pressure environments

A. S. Baluch, N. P. Guisinger, R. Basu, E. T. Foley, Mark Hersam*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy