Keyphrases
Atomic Level
100%
Ambient Conditions
100%
Si(111)
100%
Surface Following
100%
H-surfaces
100%
X-ray Photoelectron Spectroscopy
66%
Nanofabrication
33%
Microelectronics
33%
Scanning Tunneling Microscopy
33%
Ultra-high Vacuum
33%
Semiconductor Processing
33%
Atmospheric Conditions
33%
Passivated
33%
Spectroscopic Measurement
33%
Ultrapure
33%
Chemical Inertness
33%
Scanning Tunneling Microscopy Image
33%
Si (100) Substrate
33%
In Situ Hydrogen
33%
Ambient Exposure
33%
Engineering
Ambient Condition
100%
Ray Photoelectron Spectroscopy
100%
Scanning Tunneling Microscopy
100%
Microelectronics
50%
Chemical Inertness
50%
Nanofabrication Process
50%
Illustrates
50%
Material Science
Surface (Surface Science)
100%
Photoemission Spectroscopy
50%
Oxidation Reaction
25%