Auger, photoemission, and thermal desorption studies of the interaction of water vapor with Ni3(Ai, Ti) (100) and (111) surfaces

W. J. Chia, Y. W. Chung

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

The interaction of water vapor with single crystal Ni3(Al, Ti) has been studied with Auger electron spectroscopy, photoemission spectroscopy and thermal desorption. Water adsorbs molecularly onto the (111) and (100) surfaces at 140 K. When warmed up to room temperature, water remains as an intact molecule on the (111) surface, but dissociates to surface hydroxyl and atomic oxygen on the (100) surface. The latter process is accompanied by the evolution of hydrogen and oxidation of Al. It appears that Al is the active species in controlling the dissociation of water in Ni3Al.

Original languageEnglish (US)
Pages (from-to)1687-1692
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume13
Issue number3
DOIs
StatePublished - May 1995

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Auger, photoemission, and thermal desorption studies of the interaction of water vapor with Ni<sub>3</sub>(Ai, Ti) (100) and (111) surfaces'. Together they form a unique fingerprint.

Cite this