Abstract
An analysis of the effects of beam convergence is carried out for high resolution electron microscope imaging, including the changes in diffraction across the illumination aperture by a Bloch wave approach. It is shown that the effect of a small tilt u is to introduce a perturbation u·{down triangle, open}ρ{variant} into the projected 2D Schrödinger equation for the Bloch waves. By using perturbation theory (essentially a k·p analysis), it is shown that the dominant effect is a modification of the non-linear convergence envelope term between different Bloch waves. The effects should be larger for defects than for single crystals, and important for thicknesses of more than ∼ 50 nm, thicknesses similar to those at which non-linear effects are important. The general trends with structure, elemental composition and incident electron voltage are briefly described.
Original language | English (US) |
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Pages (from-to) | 351-355 |
Number of pages | 5 |
Journal | Ultramicroscopy |
Volume | 14 |
Issue number | 4 |
DOIs | |
State | Published - 1984 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Instrumentation