TY - GEN
T1 - Changes in optical properties of GaAsN during annealing
AU - Liu, Ting
AU - Chandril, S.
AU - Schires, E. D.
AU - Wu, N.
AU - Chen, Xinqi
AU - Korakakis, D.
AU - Myers, T. H.
N1 - Copyright:
Copyright 2011 Elsevier B.V., All rights reserved.
PY - 2006
Y1 - 2006
N2 - GaAs 1-xN x layers and quantum dot-like structures were grown on (100) GaAs substrates by molecular beam epitaxy. The dependence of photoluminescence emission spectra on annealing temperature is consistent with literature at lower temperatures but after annealing at 750 °C a net red-shift is consistently observed. X-ray photoelectron spectroscopy measurements indicate that for different annealing times and temperatures, the nitrogen and arsenic surface concentrations changed compared to that of as-grown samples, specifically arsenic is lost from the material. Raman measurements are consistent with the trends in photoluminescence and also suggest the loss of arsenic occurs at higher annealing temperatures in both samples capped with GaAs and uncapped samples.
AB - GaAs 1-xN x layers and quantum dot-like structures were grown on (100) GaAs substrates by molecular beam epitaxy. The dependence of photoluminescence emission spectra on annealing temperature is consistent with literature at lower temperatures but after annealing at 750 °C a net red-shift is consistently observed. X-ray photoelectron spectroscopy measurements indicate that for different annealing times and temperatures, the nitrogen and arsenic surface concentrations changed compared to that of as-grown samples, specifically arsenic is lost from the material. Raman measurements are consistent with the trends in photoluminescence and also suggest the loss of arsenic occurs at higher annealing temperatures in both samples capped with GaAs and uncapped samples.
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M3 - Conference contribution
AN - SCOPUS:33747368731
SN - 1558998454
SN - 9781558998452
T3 - Materials Research Society Symposium Proceedings
SP - 541
EP - 545
BT - Progress in Semiconductor Materials V - Novel Materials and Electronic and Optoelectronic Applications
T2 - 2005 MRS Fall Meeting
Y2 - 28 November 2005 through 2 December 2005
ER -