Changes in tip structure measured during STM lithography

J. Vetrone*, Yip-Wah Chung

*Corresponding author for this work

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

STM lithography by pulsing the tip-sample bias was used to deposit nanometer-sized clusters on a copper surface using gold tips. Prior to writing each cluster, we extracted the local tip radius of curvature from STM images of slip band steps previously formed on the copper surface. This novel technique permitted in-situ observation of changes in both cluster size and local tip structure while using a single tip. It was found that the cluster diameter increases with the square root of tip radius. Using a model in which we assume that deposition occurs only from that region of the tip within a certain distance from the sample surface, we were able to derive an expression consistent with the experimental data.

Original languageEnglish (US)
Pages (from-to)331-338
Number of pages8
JournalApplied Surface Science
Volume78
Issue number3
DOIs
StatePublished - Jan 1 1994

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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