Characterization of correlated line edge roughness of nanoscale line gratings using small angle x-ray scattering

Chengqingx Wang, Ronald L. Jones, Eric K. Lin, Wen Li Wu*, Bryan J. Rice, Kwang Woo Choi, George Thompson, Steven J. Weigand, Denis T. Keane

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    49 Scopus citations


    To meet the challenges in dimensional metrology as the minimum feature size in semiconductor devices approaches sub-35 nm length scales, we have been developing a nondestructive method using x rays termed critical dimension small angle x-ray scattering (SAXS). Its capacity to quantify the dimension of linewidth, pitch, line height, and sidewall angle of line gratings has been demonstrated. In this work, we have further extended its capabilities to quantify the correlated line-edge roughness (LER) and linewidth roughness (LWR). Model line grating patterns with controlled LER and LWR were prepared and measured using x ray, their results were analyzed with model calculations. The magnitude of LER/LWR deduced from x-ray results compares favorably with the scanning electron microscopy results obtained from the same samples. An apparent Debye-Waller factor, which can be deduced from the SAXS data without any detailed model-based calculations, is found to be a convenient parameter to quantify the amplitude of LER/LWR.

    Original languageEnglish (US)
    Article number024901
    JournalJournal of Applied Physics
    Issue number2
    StatePublished - 2007

    ASJC Scopus subject areas

    • Physics and Astronomy(all)


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