Characterization of drying techniques for micro-stereolithography

Dongmin Wu*, Nicholas Fang, Cheng Sun, Xiang Zhang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Micro-stereolithography (μSL) is an advanced technology that enables fabrication of highly complex three-dimensional polymer microstructures out of UV curable resin. However, releasing of polymerized structures from un-polymerized resin is found to influence substantially the fabrication reliability of μSL, as the surface tension tends to push the fine structures together and cause collapse or adhesion. A theoretical model is developed to analyze the deflection and adhesion between thin polymer beams under capillary force. The detachment length of the test structures and solid surface tension of a typical μSL polymer (HDDA) are obtained experimentally. In this paper, we applied sublimation process to overcome the adhesion problem. With the new drying process, no adhesion phenomenon was observed.

Original languageEnglish (US)
Title of host publicationMicro-Electro-Mechanical Systems (MEMS) - 2001
EditorsA.L. Lee, J. Simon, K. Breuer, S. Chen, R.S. Keynton, A. Malshe, J.-I. Mou, M. Dunn
Pages831-835
Number of pages5
StatePublished - 2001
Event2001 ASME International Mechanical Engineering Congress and Exposition - New York, NY, United States
Duration: Nov 11 2001Nov 16 2001

Publication series

NameAmerican Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS)
Volume3

Other

Other2001 ASME International Mechanical Engineering Congress and Exposition
Country/TerritoryUnited States
CityNew York, NY
Period11/11/0111/16/01

ASJC Scopus subject areas

  • General Engineering

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