TY - GEN
T1 - Characterization of drying techniques for micro-stereolithography
AU - Wu, Dongmin
AU - Fang, Nicholas
AU - Sun, Cheng
AU - Zhang, Xiang
N1 - Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.
PY - 2001
Y1 - 2001
N2 - Micro-stereolithography (μSL) is an advanced technology that enables fabrication of highly complex three-dimensional polymer microstructures out of UV curable resin. However, releasing of polymerized structures from un-polymerized resin is found to influence substantially the fabrication reliability of μSL, as the surface tension tends to push the fine structures together and cause collapse or adhesion. A theoretical model is developed to analyze the deflection and adhesion between thin polymer beams under capillary force. The detachment length of the test structures and solid surface tension of a typical μSL polymer (HDDA) are obtained experimentally. In this paper, we applied sublimation process to overcome the adhesion problem. With the new drying process, no adhesion phenomenon was observed.
AB - Micro-stereolithography (μSL) is an advanced technology that enables fabrication of highly complex three-dimensional polymer microstructures out of UV curable resin. However, releasing of polymerized structures from un-polymerized resin is found to influence substantially the fabrication reliability of μSL, as the surface tension tends to push the fine structures together and cause collapse or adhesion. A theoretical model is developed to analyze the deflection and adhesion between thin polymer beams under capillary force. The detachment length of the test structures and solid surface tension of a typical μSL polymer (HDDA) are obtained experimentally. In this paper, we applied sublimation process to overcome the adhesion problem. With the new drying process, no adhesion phenomenon was observed.
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M3 - Conference contribution
AN - SCOPUS:1542747763
SN - 0791835553
T3 - American Society of Mechanical Engineers, Micro-Electromechanical Systems Division Publication (MEMS)
SP - 831
EP - 835
BT - Micro-Electro-Mechanical Systems (MEMS) - 2001
A2 - Lee, A.L.
A2 - Simon, J.
A2 - Breuer, K.
A2 - Chen, S.
A2 - Keynton, R.S.
A2 - Malshe, A.
A2 - Mou, J.-I.
A2 - Dunn, M.
T2 - 2001 ASME International Mechanical Engineering Congress and Exposition
Y2 - 11 November 2001 through 16 November 2001
ER -