Characterization of line edge roughness using CD-SAXS

Ronald L. Jones*, Wen Li Wu, Cheng Qing Wang, Eric K. Lin, Kwang Woo Choi, Bryan J. Rice, George M. Thompson, Steven J. Weigand, Denis T. Keane

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Scopus citations

Abstract

We are developing a transmission X-ray scattering platform capable of measuring the average cross section and line edge roughness in patterns ranging from 10 nm to 500 nm in width with sub-nm precision. Critical Dimension Small Angle X-ray Scattering (CD-SAXS) measures the diffraction of a collimated X-ray beam with sub-Angstrom wavelength from a repeating pattern, such as those in light scatterometry targets, to determine the pattern periodicity, line width, line height, and sidewall angle. Here, we present results from CD-SAXS with an emphasis on line edge roughness characterization. Line edge roughness measurements from CD-SAXS are compared with top-down scanning electron microscopy values and comparative definitions are discussed.

Original languageEnglish (US)
Title of host publicationMetrology, Inspection, and Process Control for Microlithography XX
Volume6152 I
DOIs
StatePublished - Jul 10 2006
EventMetrology, Inspection, and Process Control for Microlithography XX - San Jose, CA, United States
Duration: Jan 20 2006Jan 23 2006

Other

OtherMetrology, Inspection, and Process Control for Microlithography XX
CountryUnited States
CitySan Jose, CA
Period1/20/061/23/06

    Fingerprint

Keywords

  • Critical Dimension Metrology
  • Extreme Ultraviolet Lithography
  • Line Edge Roughness
  • Scatterometry

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Jones, R. L., Wu, W. L., Wang, C. Q., Lin, E. K., Choi, K. W., Rice, B. J., Thompson, G. M., Weigand, S. J., & Keane, D. T. (2006). Characterization of line edge roughness using CD-SAXS. In Metrology, Inspection, and Process Control for Microlithography XX (Vol. 6152 I). [61520N] https://doi.org/10.1117/12.656829