@inproceedings{bf7425c8a6994adc9906fa3a055f5847,
title = "Characterization of line edge roughness using CD-SAXS",
abstract = "We are developing a transmission X-ray scattering platform capable of measuring the average cross section and line edge roughness in patterns ranging from 10 nm to 500 nm in width with sub-nm precision. Critical Dimension Small Angle X-ray Scattering (CD-SAXS) measures the diffraction of a collimated X-ray beam with sub-Angstrom wavelength from a repeating pattern, such as those in light scatterometry targets, to determine the pattern periodicity, line width, line height, and sidewall angle. Here, we present results from CD-SAXS with an emphasis on line edge roughness characterization. Line edge roughness measurements from CD-SAXS are compared with top-down scanning electron microscopy values and comparative definitions are discussed.",
keywords = "Critical Dimension Metrology, Extreme Ultraviolet Lithography, Line Edge Roughness, Scatterometry",
author = "Jones, {Ronald L.} and Wu, {Wen Li} and Wang, {Cheng Qing} and Lin, {Eric K.} and Choi, {Kwang Woo} and Rice, {Bryan J.} and Thompson, {George M.} and Weigand, {Steven J.} and Keane, {Denis T.}",
year = "2006",
doi = "10.1117/12.656829",
language = "English (US)",
isbn = "0819461954",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Metrology, Inspection, and Process Control for Microlithography XX",
note = "Metrology, Inspection, and Process Control for Microlithography XX ; Conference date: 20-01-2006 Through 23-01-2006",
}