Characterization of magnetron sputtering TiB2 and Ti-B-N thin films

Tong Jun Zhang*, Wong Manoj, W. D. Sproul, Yip-Wah Chung

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

TiB2 and Ti-B-N films on various substrates were synthesized using ionized de-magnetron sputtering. A two-turn coil powered by 13.56 MHz r. f. was used to enhance the ionization fraction of the plasma. The structure and properties of the films are affected by several parameters such as substrate bias, total pressure and nitrogen partial pressure and by the substrate materials. The crystallinity and the hardness of the films increase with decreasing total pressure. Well crystallized TiB2 films with strong (0001) texture and with hardness up to 50 GPa were produced. Nitrogen doping into TiB2 films decreases their crystallinity and hardness. About 1 GPa residual compressive stress was determined by a wafer curvature technique. It was performed that the dry friction of several different hard films against hardened 52100 steel, which showed the TiB2 and Ti-B-N films existing the lowest friction coefficient and the lowest wear rate.

Original languageEnglish (US)
Pages (from-to)619-624
Number of pages6
JournalTransactions of Nonferrous Metals Society of China (English Edition)
Volume10
Issue number5
StatePublished - Dec 1 2000

Keywords

  • De-magnetron sputtering
  • Mechanical properties
  • Residual stress
  • Tib and ti-b-n coating
  • Tribology

ASJC Scopus subject areas

  • Metals and Alloys

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