Comparative study of typical defects in III-nitride thin films and their alloys

INIS

• films 100%
• density 66%
• gallium nitrides 66%
• microstructure 66%
• thin films 50%
• defects 50%
• transmission electron microscopy 33%
• devices 33%
• dislocations 33%
• screws 33%
• edge dislocations 33%
• resolution 16%
• correlations 16%
• growth 16%
• surfaces 16%
• alloys 16%
• variations 16%
• organometallic compounds 16%
• layers 16%
• diffraction 16%
• chemical vapor deposition 16%
• optical properties 16%
• grain boundaries 16%
• nitrides 16%

Material Science

• Liquid Films 83%
• Density 66%
• Microstructure 66%
• Thin Films 50%
• Defect 50%
• Edge Dislocation 33%
• Devices 33%
• Dislocation 33%
• Alloy 16%
• Heterojunction 16%
• Al2O3 16%
• Microscopy 16%
• Structural Property 16%
• Metal-Organic Chemical Vapor Deposition 16%
• Nitride Compound 16%
• Transmission Electron Microscopy 16%
• Surface 16%
• Correlation 16%
• High-Resolution Transmission Electron Microscopy 16%
• Optical Property 16%
• Electrical Property 16%
• Grain Boundary 16%