Computer-controlled four-gun multisubstrate sputtering system for the preparation of composition-modulated structures

H. Q. Yang*, B. Y. Jin, Y. H. Shen, H. K. Wong, J. E. Hilliard, John B Ketterson

*Corresponding author for this work

Research output: Contribution to journalArticle

11 Scopus citations

Abstract

We describe a four-gun sputtering system which has been used successfully to prepare composition-modulated structures consisting of amorphous semiconductors and superconducting alloys or binary compounds. The substrates are mounted in ovens which can be individually heated to over 1000°C. The ovens are mounted on a wheel which is driven by a computer-controlled stepping motor. With appropriate programming of the movement of the stepping motor, the deposition sequence is determined.

Original languageEnglish (US)
Pages (from-to)607-612
Number of pages6
JournalReview of Scientific Instruments
Volume56
Issue number4
DOIs
StatePublished - Dec 1 1985

ASJC Scopus subject areas

  • Instrumentation

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